内容详细
- 国际实验室系列讲座36—香港理工大学丁峰教授
- 发布时间：2014-05-12 点击次数：1
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2014年4月16日上午10点，国际实验室系列学术讲座2014年上半年第三期报告在A718室举行，本次讲座邀请到香港理工大学丁峰教授来苏州纳米所进行学术交流。丁峰教授作了题为 “The Mechanisms of Graphene Chemical Vapor Deposition (CVD) Growth”的学术报告。报告会由陈韦研究员主持，相关科研人员和学生聆听了报告。
报告现场
Brief Bio. of Dr. Feng DINGFeng Ding obtained his Bs, Ms and PhD degrees from Huazhong University of Science and Technology, Fudan University and Nanjing University in 1993, 1996 and 2002, respectively. Then he was a Postdoctoral Research Fellow in Gothenburg University and Chalmers University in Sweden from 2003 to 2005. From 2005, he joined Prof. Boris I. Yakobson’s research group of Rice University as a Research Scientist until the end of 2008. He joined the Institute of Textile and Clothing of Hong Kong Polytechnic University as an Assistant Professor in 20109 and became a tenured associate professor from Jnue 2013.Dr. Ding’s research interests mainly focus on the growth mechanism, properties and applications of various carbon materials (fullerene, carbon nanotubes and graphene). Dr. Ding has published more than 110 SCI papers and these publications. These publications have been cited by more than 2400 times until now and his personal h-inex is 27 now. His research group is currently focusing on the mechanism of chirality control in carbon nanotube growth, the mechanism of graphene CVD growth and is also exploring the mechanism of nanowire growth.